Previous close | 21.60 |
Open | 22.00 |
Bid | 22.00 x 200000 |
Ask | 23.00 x 200000 |
Day's range | 22.00 - 22.00 |
52-week range | 18.90 - 26.40 |
Volume | |
Avg. volume | 4 |
Market cap | 7.164B |
Beta (5Y monthly) | 0.67 |
PE ratio (TTM) | 21.78 |
EPS (TTM) | 1.01 |
Earnings date | 13 May 2024 |
Forward dividend & yield | 0.29 (1.36%) |
Ex-dividend date | 28 Mar 2024 |
1y target est | N/A |
Toppan Photomask, the world's premier semiconductor photomask provider, announced that it has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. This agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.