Previous close | 25.68 |
Open | 25.68 |
Bid | N/A x N/A |
Ask | N/A x N/A |
Day's range | 25.68 - 25.68 |
52-week range | 19.40 - 28.53 |
Volume | |
Avg. volume | 8 |
Market cap | 8.104B |
Beta (5Y monthly) | 0.67 |
PE ratio (TTM) | 24.00 |
EPS (TTM) | 1.07 |
Earnings date | 13 May 2024 |
Forward dividend & yield | 0.32 (1.23%) |
Ex-dividend date | 28 Mar 2024 |
1y target est | N/A |
Toppan Photomask, the world's premier semiconductor photomask provider, announced that it has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. This agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.